| EUV多层膜平面反射镜 AOI = 5 ° | EUV多层膜平面反射镜 AOI = 45 ° | EUV多层膜球面反射镜 AOI = 5 ° | |
| 反射率 | R＞65% @13.5nm | R＞67% @13.5nm | R＞65% @13.5nm |
| 镀膜材料 | Mo/Si | Mo/Si | Mo/Si |
| AOI | 5° | 45° | 5° |
| Bandwidth (FWHM) | appr. 500 pm | appr. 950 pm | appr. 500 pm |
| 基底 | fused silica | fused silica | fused silica |
| 尺寸 | 25.4 ±0.1 mm | 25.4 ±0.1 mm | 25.4 ±0.1 mm |
| 厚度 | 6.35 ±0.1 mm | 6.35 ±0.1 mm | 6.35 ±0.1 mm |
| 面形精度 | λ/20 @ 632.8 nm | λ/20 @ 632.8 nm | λ/20 @ 632.8 nm |
| 表面粗糙度 | σ< 0.2 nm rms | σ< 0.2 nm rms | σ< 0.2 nm rms |
| 曲率半径 | - | - | 500 mm (± 1 %) |
实测反射率
主要应用：
极紫外相干衍射成像
极紫外显微成像