微纳X射线分辨率测试卡
X射线分辨率测试卡是测量成像系统成像质量的重要工具，我司可提供各种类型的测试卡以满足您的各种需求。图案类型包括线对、孔阵列和西门子星等。显微CT分辨测试卡布局由嵌套的L形组成，线宽为:50 –40 –30 –20 –15 –10 –9 –8 –7 -6 -5 –4 –3 -2 –1.5 -1 –0.9 -0.8 -0.7 –0.6 -0.5 –0.4 –0.35 –0.3 –0.25 –0.2（微
- 产地： 瑞士
- 型号：
- 品牌： XRnanotech
X射线分辨率测试卡是测量成像系统成像质量的重要工具，我司可提供各种类型的测试卡以满足您的各种需求。图案类型包括线对、孔阵列和西门子星等。
1. Nanostructured Resolution X-ray samples
1.1 Nanostructured Resolution X-ray samples (50 nm) made from Au on a
Substrate:
6 mm x 6 mm x 0.25 mm
silicon chip with
2 mm x 2 mm x 250 nm Si3N4 window
Geometries include:
nested L-shape structures
Siemens star test patterns
The parameters are as follows:
Gold height > 800 nm
Smallest Feature size of Au ca. 50 nm
1.2 Nanostructured High Resolution X-ray samples (10 nm - 30 nm) made from SiO2 and Ir and Au on a
Substrate:
6 mm x 6 mm x 0.25 mm
silicon chip with
2 mm x 2 mm x 250 nm Si3N4 window
Geometries include:
nested L-shape structures
Siemens star test patterns
The parameters are as follows:
1.2.1 Hybrid High Resolution X-ray Sample (30 nm)
Smallest Feature size of Ir 30 nm
Material height: >400 nm
Gold height > 500 nm
Smallest Feature size of Au ca. 50 nm
1.2.2 Hybrid Super-High Resolution X-ray Sample (20 nm)
Smallest Feature size of Ir 20 nm
Material height: >200 nm
Gold height > 500 nm
Smallest Feature size of Au ca. 50 nm
1.2.3 Hybrid Ultra-High Resolution X-ray Sample (10 nm)
Smallest Feature size of Ir 10 nm
Material height: >100 nm
Gold height > 500 nm
Smallest Feature size of Au ca. 50 nm
MOUNTING (optional)
XRnanotech will mount chip on holder provided by customer
OR
XRnanotech will mount chip on XRnanotech standard holder.
2. MicroCT Test Target
2.1 MicroCT Test Target(400nm)
Substrate:
9 mm x 9 mm x 0.25 mm
silicon chip with
3 mm x 3 mm x 250 nm Si3N4 window
Geometry:
nested L-shape structures
Siemens-star
The parameters are as follows:
Gold height ~4000 nm
Smallest Feature size of Au ca. 200 nm
2.2 MicroCT Test Target(300nm)
Substrate:
9 mm x 9 mm x 0.25 mm
silicon chip with
3 mm x 3 mm x 250 nm Si3N4 window
Geometry:
nested L-shape structures
Siemens-star
The parameters are as follows:
Gold height ~4000 nm
Smallest Feature size of Au ca. 300 nm
2.3 MicroCT Test Target(200nm)
Substrate:
9 mm x 9 mm x 0.25 mm
silicon chip with
3 mm x 3 mm x 250 nm Si3N4 window
Geometry:
nested L-shape structures
optionally: Siemens-star
The parameters are as follows:
Gold height ~1500 nm
Smallest Feature size of Au ca. 200 nm
2.4 MicroCT Test Target(100nm)
Substrate:
9 mm x 9 mm x 0.25 mm
silicon chip with
3 mm x 3 mm x 250 nm Si3N4 window
Geometry:
nested L-shape structures
Siemens-star
The parameters are as follows:
Gold height >1000 nm
Smallest Feature size of Au ca. 100 nm
Will be delivered mounted on XRnanotech-holder by default.