Two-photon grayscale lithography is a micro/nano fabrication technology based on nonlinear optical effects. Its principle involves using high-intensity femtosecond lasers to cause photosensitive molecules in the material to simultaneously absorb two low-energy photons (with total energy equal to that of single-photon absorption), thereby triggering polymerization. Since two-photon absorption occurs only in the high-energy-density region at the laser focus, complex shapes can be fabricated with high precision through layer-by-layer construction. This enables the manufacturing of precise three-dimensional structures.

Nanoscribe GT system

  • Full 3D fabrication capability with minimum feature sizes below 200 nm.
  • Supports multiple materials, including optional aluminum oxide coatings to enhance resolution and contrast.
  • One-stop service from design to finished product

Nanoscribe Quantum X system

  • Latest technology combining the superior performance of grayscale lithography with the precision and flexibility of two-photon polymerization (2PP).
  • Maskless lithography system suitable for industrial fabrication of various 2.5D structures.


Typical applications

  • Surface patterning, planar micro-optical components (including freeform lenses and microlens arrays).
  • Multilevel diffractive optical elements.

Example microstructures

  • High-aspect-ratio microlens array: 50 µm
  • Fresnel lens: 100 µm