1- and 0.5-inch 13.5 nm Extreme Ultraviolet Multilayer Mirrors
Top Unistar, in cooperation with optiXfab from Germany, has launched high-performance Mo/Si multilayer mirrors for the 13.5 nm wavelength range, available in standard sizes including 1 inch and 1/2 inch. This product series can be widely applied in cutting-edge research areas such as HHG light sources, laser-driven plasma light sources, EUV imaging, EUV metrology, and EUV spectroscopy. In addition, relevant products have been stocked locally in China to enable rapid response and delivery, providing more efficient and convenient support for users' scientific research projects.
Model: 定制
Brand: optiX fab.
Introduction
Beijing Top Unistar Technology Co., Ltd. has accumulated nearly a decade of in-depth expertise in the X-ray and extreme ultraviolet (EUV) fields, along with a solid understanding of EUV optical technology trends and the demands of the Chinese market. Similarly founded in 2013, Germany's optiXfab specializes in commercializing the Fraunhofer Institute's patented Mo/Si multilayer coating technology and has produced nearly 20,000 high-performance EUV and X-ray mirrors for customers, most of whom are clients in the semiconductor and aerospace industries, including key optical components such as collector mirrors for LLP light sources and Schwarzschild objectives. With extensive industrialization experience and mature manufacturing processes, and based on long-term, in-depth technical exchanges and market analysis between the two parties, we have established a deep cooperation and decided to further extend this advanced coating technology, validated by the semiconductor industry, to scientific research applications. Together, we are launching high-performance Mo/Si multilayer mirrors suitable for the13.5 nm wavelength band, available in standard sizes such as 1 inch and 1/2 inch. This product series can be widely applied in cutting-edge research areas including HHG light sources, laser-driven plasma light sources, EUV imaging, EUV metrology, and EUV spectroscopy. In addition, related products are now stocked locally in China, enabling rapid response and delivery to provide more efficient and convenient support for users' scientific research projects.
Features & Advantages
Specifications
| Product Name | 5° EUV Multilayer Plane Mirror | 5° EUV Multilayer Spherical Mirror | 45° EUV Multilayer Plane Mirror |
| Central Wavelength | 13.5nm（±0.05nm） | 13.5nm（±0.05nm） | 13.5nm（±0.05nm） |
| Reflectivity (s-pol) | R＞65% @13.5nm | R＞65% @13.5nm | R＞65% @13.5nm |
| Coating material | Mo/Si | Mo/Si | Mo/Si |
| Incidence angle | 5° | 5° | 45° |
| Bandwidth (FWHM) | appr. 500 pm | appr. 500 pm | appr. 950 pm |
| Substrate | fused silica | fused silica | fused silica |
| Dimensions | 25.4/12.7 -0.1 mm | 25.4/12.7 -0.1 mm | 25.4/12.7 -0.1 mm |
| Thickness | 6.5 ±0.25 mm | 6.5 ±0.25 mm | 6.5 ±0.25 mm |
| Figure accuracy | λ/20 @ 632.8 nm | λ/20 @ 632.8 nm | λ/20 @ 632.8 nm |
| Surface roughness | σ< 0.2 nm rms | σ< 0.2 nm rms | σ< 0.2 nm rms |
| Radius of curvature | - | 500mm | - |
Reflectance measured by PTB Germany
Applications
Literature
4 references found
Researchers used planar and spherical 13.6 nm Mo/Si multilayer mirrors produced by optiXfab to study the spatiotemporal characteristics of an LPP extreme ultraviolet (EUV) light source. The multilayer mirrors served here as the objective lens and monochromator.
Researchers used a concave spherical 13.5 nm narrowband Mo/Si multilayer mirror and a greateyes EUV CCD camera to image the emission region of an LPP EUV light source at 13.5 nm +/-1% bandwidth. The multilayer mirror here served as both the objective lens and the monochromator.
Researchers used a planar 45-degree Mo/Si multilayer mirror produced by optiXfab to direct, polarize, and monochromatize the light generated by a DPP extreme ultraviolet (EUV) light source, in order to achieve exposure of the downstream photoresist.
About Top Unistar and optiXfab
optiX fab, a spin-off of Fraunhofer IOF founded in 2013, is a German company established to commercialize Fraunhofer IOF's research and development activities in XUV/soft and hard X-ray optics. It is dedicated to the design, development, and manufacturing of various multilayer mirrors.optiXfab hasprovided customized multilayer and grazing-incidence optics for the XUV/soft and hard X-ray spectral ranges to high-end manufacturers, research institutes, universities, and synchrotron customers worldwide. Top Unistar, in collaboration with optiXfab, offers all pre-sales consultation, sales, and after-sales services to customers in China. Additionally, as a leading service and solution provider in the EUV-X-ray field, Top Unistar has built up a certain inventory ofEUV and X-ray related equipment and core components, enabling rapid delivery to better serve our customers. We have also established a well-equippedX-ray open laboratory, equipped with multiple advanced X-ray light source systems, optical components, and detectors, capable of supporting diverse testing, preliminary research, and validation work including X-ray imaging, phase-contrast imaging, diffraction analysis, fluorescence detection, and characterization of X-ray source performance.
We are a team passionate about extreme ultraviolet (EUV) and X-ray technology. If you have any questions and would like to communicate or discuss with us, do not hesitate to contact us directly.
