Extreme Ultraviolet Carbon Nanotube (CNT) Pellicle
Our company currently offers high-quality extreme ultraviolet (EUV) carbon nanotube (CNT) pellicles for fundamental research related to EUV and X-rays.
Introduction
Debris contamination is unavoidable during the generation and emission of EUV light. In addition to using favorable measures such as electric fields, magnetic fields, and gas purging to alter the direction of debris movement and reduce the entry of contamination sources into the EUV optical path, employing thin-film components with high transmittance to EUV light to block and isolate debris is a core step in achieving high-resolution patterned lithography. The new generation of EUV thin-film components mainly uses carbon-based materials, such as graphene films and carbon nanotube (CNT) films. Compared with early crystalline silicon films, carbon-based films offer higher EUV transmittance. Moreover, the excellent thermal conductivity and mechanical stability of carbon materials enable such thin-film materials to meet the debris protection requirements during EUV lithography. Currently, our company can provide high-quality extreme ultraviolet carbon nanotube (CNT) protective films for fundamental research related to EUV and X-rays.
Specifications
Key parameters of the protective membrane:
Membrane size: Ø14.7mm / 25mm (self-supporting)
Outgassing material: none
Transmittance at 13.5nm >85% (equivalent test using 550nm light)
Transmittance uniformity at 13.5nm: +/1 %
Particle protection capability: >95% (particle size 30nm to 1µm)
Fig. 1 Dimensional drawing of the EUV carbon nanotube (CNT) pellicle
Main parameters of the frame:
Frame inner diameter: 15 mm / 25.4 mm
Supported outer diameter: 24 mm / 34.4 mm
Frame thickness: 2.6 mm
Frame material: 304 stainless steel, non-outgassing
Top Unistar is a supplier of core EUV-X-ray components and solutions. In addition to extreme ultraviolet (EUV) carbon nanotube (CNT) protective membranes, we can also provide various other types of EUV and X-ray filters, such as self-supporting metal filter membranes and multilayer reflective filters. Details are as follows:
Figure 2 Various EUV and X-ray filters (some in stock)
About Top Unistar
As a leading service and solution provider in the EUV-X-ray field, Top Unistar has built up a certain scale ofinventory of EUV and X-ray related equipment and core components, enabling rapid delivery to better serve our users. Meanwhile, we have established a well-equippedX-ray open laboratory, furnished with multiple advanced X-ray light source systems, optical components, and detectors, capable of supporting diverse testing, pre-research, and feasibility studies including X-ray imaging, phase-contrast imaging, diffraction analysis, fluorescence detection, and X-ray source performance characterization.
We are a team passionate about extreme ultraviolet and X-ray technologies. If you have any questions you would like to discuss with us, do not hesitate to contact us directly.
