XUV Broadband Mirror
To meet the demand for high reflectance over a broad spectral range, we offer aperiodic multilayer coatings designed for applications such as spectroscopy.
Introduction
Benefiting from Top Unistar's nearly 10 years of focus on X-ray and extreme ultraviolet (EUV) technology in China, the company has gained an in-depth understanding of EUV optical technology and the Chinese market. Meanwhile, Germany's optiXfab has been commercializing the Fraunhofer Institute's Mo/Si multilayer coating technology since 2012, having produced nearly 20,000 mirrors for customers, most of whom are in the semiconductor industry, such as collector mirrors for LLP light sources and Schwarzschild objectives. After thorough discussions and close collaboration, we have jointly decided to promote the coating technology mature in semiconductor industrial applications to scientific research applications based on HHG and laser-driven plasma compact EUV light sources.For the Chinese market, we jointly launch high-performance 13.5nm multilayer mirrors in 1/0.5 inch sizes, with inventory stocked at the China office to ensure rapid delivery. At the same time, we bring EUVL-grade coating technology to China's basic research market and offer flexible customization services to meet the special requirements of cutting-edge scientific research.
Features & Advantages
Specifications
Typical substrate specifications
| Parameter | Plane substrate | Spherical substrate |
| Material | fused silica | fused silica |
| Dimensions | 25.4 -0.1 mm/12.7-0.1 mm | 25.4 -0.1 mm/12.7-0.1 mm |
| Thickness | 6.35 ±0.25 mm | 6.35 ±0.25 mm |
| Figure accuracy | λ/20 @ 632.8 nm PV | λ/20 @ 632.8 nm PV |
| Surface roughness | σ< 0.2 nm rms | σ< 0.2 nm rms |
| Radius of curvature | - | 500 mm (± 1 %) |
Typical measured reflectance and bandwidth
When making an inquiry, please provide the following information
● Central wavelength
● Reflection bandwidth (FWHM)
● Required minimum reflectivity,
● Angle of incidence
● Polarization
● Substrate size and shape
● Quantity
Applications
About Top Unistar and optiX fab
optiX fab, Germany, is a spin-off company incubated by Fraunhofer IOF and founded in 2013 to commercialize Fraunhofer IOF's research and development activities in XUV/soft and hard X-ray optics, dedicated to the design, development, and fabrication of various multilayer mirrors.optiXfab hasprovided customized multilayer and grazing-incidence optics for the XUV/soft and hard X-ray spectral ranges to leading global manufacturers as well as research institutes, universities, and synchrotron customers. Top Unistar, in partnership with optiXfab, offers all pre-sales consultation, sales, and after-sales services to users in China. Meanwhile, as a frontier service and solution provider in the EUV-X-ray field, Top Unistar has built up a certain inventory ofEUV and X-ray related equipment and core components, enabling rapid delivery to better serve our users. Additionally, we have established a well-equippedX-ray open laboratory, equipped with multiple advanced X-ray light source systems, optical components, and detectors, capable of supporting diverse testing, preliminary research, and validation work including X-ray imaging, phase-contrast imaging, diffraction analysis, fluorescence detection, and characterization of X-ray source performance.
We are a team passionate about extreme ultraviolet (EUV) and X-ray technologies. If you have any questions you would like to discuss or explore with us, do not hesitate to contact us directly.
