XUV multilayer narrowband mirror
Standard multilayer mirrors for the extreme ultraviolet spectral range reflect only a narrow wavelength band and can therefore be used as monochromators (typical value: at λ = 13.5 nm, Δλ ≈ 0.5 nm), but with limited resolution. A new coating design developed by Top Unistar's partner optiX fab significantly improves the resolution, and we can provide an optimized multilayer design for the wavelength and angle of incidence.
Model: 定制
Brand: optiX fab.
Introduction
Benefiting from Beijing Top Unistar Technology Co., Ltd.'s focus on X-ray and extreme ultraviolet (EUV) technology in China and nearly a decade of accumulated expertise, the company has gained an in-depth understanding of EUV optical technology and the Chinese market. Meanwhile, Germany's optiXfab has been commercializing the Fraunhofer Institute's Mo/Si multilayer coating patent technology since 2012, having produced nearly 20,000 mirrors for customers to date, most of whom are from the semiconductor industry, such as collector mirrors for LLP light sources and Schwarzschild objectives. After thorough discussions and close collaboration between the two parties, we have jointly decided to promote the coating technology matured in semiconductor industrial applications to scientific research applications based on HHG and laser-driven plasma compact EUV light sources. Targeting the Chinese market, we jointly launch high-performance 13.5 nm multilayer mirrors in 1/0.5 inch sizes, with inventory stocked at our China office to enable rapid delivery of mirrors. At the same time, we bring EUVL-grade coating technology to China's basic scientific research market and offer flexible customization services to meet the special requirements of cutting-edge scientific research.
Standard multilayer mirrors for the EUV spectral range have a relatively narrow reflection wavelength range, allowing them to be used as monochromators (typically: at λ = 13.5 nm, Δλ ≈ 0.5 nm), but with low resolution. The novel coating designs developed by Top Unistar's partner optiXfab significantly improve resolution, while we can provide optimal multilayer designs tailored to specific wavelengths and incidence angles.
Features & Advantages
Specifications
Typical substrate specifications
| Parameter | Flat substrate | Spherical substrate |
| Material | fused silica | fused silica |
| Dimensions | 25.4 -0.1 mm/12.7-0.1 mm | 25.4 -0.1 mm/12.7-0.1 mm |
| Thickness | 6.35 ±0.25 mm | 6.35 ±0.25 mm |
| Figure accuracy | λ/20 @ 632.8 nm PV | λ/20 @ 632.8 nm PV |
| Surface roughness | σ< 0.2 nm rms | σ< 0.2 nm rms |
| Radius of curvature | - | 500 mm (± 1 %) |
Measured typical reflectivity and bandwidth
Typical applications
- Higher harmonic separation
- Monochromatic EUV light source
- Spectroscopy, e.g., in astronomy
- Plasma light source characterization
When inquiring, please provide the following information
● Central wavelength
● Reflection bandwidth (FWHM)
● Required minimum reflectivity,
● Angle of incidence
● Polarization
● Substrate size and shape
● Quantity
Applications
About Top Unistar and optiX fab
optiX fab, Germany, is a spin-off incubated by Fraunhofer IOF, founded in 2013 to commercialize Fraunhofer IOF's research and development activities in XUV/soft and hard X-ray optics, dedicated to the design, development, and fabrication of various multilayer mirrors.optiXfab hasprovided customized multilayer and grazing-incidence optics for the XUV/soft and hard X-ray spectral ranges to high-end manufacturers, research institutes, universities, and synchrotron customers worldwide. Top Unistar, in partnership with optiXfab, offers Chinese users all pre-sales consultation, sales, and after-sales services. Additionally, as a leading service and solution provider in the EUV-X-ray field, Top Unistar has built up a certain inventory ofEUV and X-ray related equipment and core components, enabling rapid delivery to better serve our users. We have also established a well-equippedX-ray open laboratory, equipped with multiple advanced X-ray light source systems, optical components, and detectors, capable of supporting diverse testing, preliminary research, and validation work including X-ray imaging, phase-contrast imaging, diffraction analysis, fluorescence detection, and characterization of X-ray source performance.
We are a team passionate about extreme ultraviolet (EUV) and X-ray technologies. If you have any questions and would like to communicate or discuss with us, do not hesitate to contact us directly.
