XUV multilayer high-reflectivity mirror (>13.5 nm)
The XUV spectral range above 13.5 nm is of great importance for high-order harmonics, astronomy, X-ray lasers, and other applications. In particular, high-order harmonics are used in fundamental research such as attosecond dynamics measurements, angle-resolved photoelectron spectroscopy, and two-photon absorption. In this spectral range, we can provide flexible coating designs with guaranteed reflectivity for applications such as harmonic selection and focusing of HHG light sources.
Model: 定制
Brand: optiX fab.
Introduction
Benefiting from Beijing Top Unistar Co., Ltd.'s nearly 10 years of focus and accumulation in X-ray and extreme ultraviolet (EUV) technology in China, the company has gained an in-depth understanding of EUV optical technology and the Chinese market. Meanwhile, Germany's optiXfab has been commercializing the Fraunhofer Institute's Mo/Si multilayer coating patent technology since 2012, having produced nearly 20,000 mirrors for customers to date, most of which serve semiconductor industry clients, such as collector mirrors for LPP light sources and Schwarzschild objectives. After thorough discussions and close collaboration, we have jointly decided to promote the coating technology mature in semiconductor industrial applications to scientific research applications based on HHG and laser-driven plasma compact EUV light sources. Targeting the Chinese market, we jointly launch high-performance 13.5 nm multilayer mirrors in 1/0.5 inch sizes, with inventory stocked at our China office to enable rapid delivery. At the same time, we bring EUVL-grade coating technology to China's basic research market and offer flexible customization services to meet the special requirements of cutting-edge scientific research.
For wavelengths above 13.5 nm, the XUV band is of great importance for high-order harmonics, astronomy, X-ray lasers, and other applications. In particular, high-order harmonics are relevant to fundamental research such as attosecond dynamics measurement, angle-resolved photoelectron spectroscopy, and two-photon absorption. In this band, we can provide flexible coating designs with guaranteed reflectivity for applications such as harmonic selection and focusing in HHG light sources.
Features & Advantages
Specifications
Typical substrate specifications
| Parameter | Flat substrate | Spherical substrate |
| Material | fused silica | fused silica |
| Dimension | 25.4 -0.1 mm/12.7-0.1 mm | 25.4 -0.1 mm/12.7-0.1 mm |
| Thickness | 6.35 ±0.25 mm | 6.35 ±0.25 mm |
| Figure accuracy | λ/20 @ 632.8 nm PV | λ/20 @ 632.8 nm PV |
| Surface roughness | σ< 0.2 nm rms | σ< 0.2 nm rms |
| Radius of curvature | - | 500 mm (± 1 %) |
Measured reflectivity of typical multilayer design
- HHG harmonic selection
- XUV monochromator
- Plasma light source analysis
- Astronomical observation
When making an inquiry, please provide the following information
● Central wavelength
● Reflection bandwidth (FWHM)
● Required minimum reflectivity,
● Angle of incidence
● Polarization
● Substrate size and shape
● Quantity
Applications
About Top Unistar and optiX fab
optiX fab GmbH, Germany, is a spin-off company incubated by Fraunhofer IOF, founded in 2013 to commercialize Fraunhofer IOF's research and development activities in XUV/soft and hard X-ray optics, dedicated to the design, development, and manufacture of various multilayer mirrors.optiXfab hasprovided customized multilayer and grazing-incidence optics for the XUV/soft and hard X-ray spectral ranges to high-end manufacturers, research institutes, universities, and synchrotron customers worldwide. Top Unistar, in partnership with optiXfab, offers Chinese users all pre-sales consultation, sales, and after-sales services. Additionally, as a leading service and solution provider in the EUV-X-ray field, Top Unistar has built up a certain inventory ofEUV and X-ray related equipment and core components, enabling rapid delivery to better serve our users. We have also established a well-equippedX-ray open laboratory, equipped with multiple advanced X-ray light source systems, optical components, and detectors, capable of supporting diverse testing, preliminary research, and validation work including X-ray imaging, phase-contrast imaging, diffraction analysis, fluorescence detection, and characterization of X-ray source performance.
We are a team passionate about extreme ultraviolet (EUV) and X-ray technologies. If you have any questions and would like to communicate or discuss with us, do not hesitate to contact us directly.
