13.5 nm Fresnel Zone Plate

Contrast material: SiO2; contrast material thickness: ~250 nm; support membrane material: Si; support membrane thickness: ~200 nm; support membrane transmittance: ~70% at 13.5 nm; expected diffraction efficiency: >14% at 13.5 nm. Main applications: coherent diffraction imaging and mask inspection.

Brand: XRnanotech

Introduction

XRnanotech is the result of more than 10 years of research and development at the renowned Paul Scherrer Institute in Switzerland, founded in 2020 to bring the latest breakthrough innovations in X-ray optics to market. XRnanotech focuses on the study of nanostructures and the development and manufacture of the most innovative X-ray optical components to achieve the highest resolution, efficiency, stability, and design quality. The product line includes Fresnel zone plates, nanoscale gratings, diamond optical components, nanoresolution test targets, and 3D resolution test targets. The Fresnel zone plates manufactured by XRnanotech can achieve resolutions as low as <10 nm, and with its unique Ir-line multiplication technology, X-ray beam focusing accurate to 5 nm can be achieved, making XRnanotech the world record holder in X-ray lenses.

At the same time, to enable researchers and engineers to start experiments quickly, we stock Fresnel zone plates (FZP) for the extreme ultraviolet (EUV) range in various specifications to ensure rapid delivery of FZPs.

General Parameters

Contrast material
SiO2
Contrast material thickness
~250nm
Support membrane material
Si
Support membrane thickness
~200nm
Support membrane transmittance
~70%@13.5nm
Expected diffraction efficiency
>14% @13.5nm

About Top Unistar and XRnanotech

XRnanotechis a high-tech enterprise founded in 2020, stemming from more than a decade of cutting-edge research and development at the Paul Scherrer Institut in Switzerland, dedicated to bringing breakthrough innovations in nanoscale optics to industrial application. Among its subsidiaries, MicroWorks GmbH in Germany excels in manufacturing high-aspect-ratio micro- and nanostructures using LIGA technology.

The company's vision is to empower optical instruments worldwide to fully realize their performance potential and push beyond existing technological boundaries; its mission focuses on developing and manufacturing nanoscale optical components of the highest caliber, achieving ultimate optimization in key metrics such as resolution, efficiency, stability, and structural design.

Its product line includes extreme ultraviolet (EUV) and X-ray Fresnel zone plates, X-ray phase-contrast gratings, diamond optical components, X-ray micro- and nano-resolution test targets, metalenses, and neutron gratings, with applications spanning X-ray scientific research, materials analysis, medical imaging, and other cutting-edge fields. Leveraging its unique Ir-line multiplication technology,XRnanotech it can fabricate Fresnel zone plates with resolutions as low as <10nm, available in various materials such as gold, nickel, silicon (silicon dioxide), iridium, chromium, and even diamond.

TopUnistarAs the SwissXRnanotechcompany's exclusive agent in China, Top Unistar provides all pre-sales consultation, sales, and after-sales services to Chinese users. Meanwhile, as a leading service and solution provider in the EUV and X-ray field, Top Unistar has built up a certain inventory ofEUV and X-ray related equipment and core components, enabling rapid delivery to better serve our users. In addition, we have established a fully equippedX-ray open laboratory, outfitted with multiple advanced X-ray light source systems, optical components, and detectors, supporting a variety of testing, pre-research, and feasibility studies including X-ray imaging, phase-contrast imaging, diffraction analysis, fluorescence detection, and X-ray source performance characterization.

We are a team passionate about extreme ultraviolet (EUV) and X-ray technology. If you have any questions you would like to discuss with us, please do not hesitate to contact us directly.

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