Hardware ProductsOpticsEUV/XUV/SXR 13.5 nm EUV LensMulti‑capillaryPolycapillary Extreme Ultraviolet and X-ray Lenses

Polycapillary Extreme Ultraviolet and X-ray Lenses

• Integrated with compact low-power supplies, providing flux equivalent to rotating anode sources • Broad spectral bandwidth: 50 eV - 50 KeV • Point-to-point focusing beams • Point-to-parallel beams • Customizable housing designs

Brand: XOS

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Introduction

Custom polycapillary X-ray optical solutions are provided based on customer requirements.

Polycapillary collimating lens devices convert highly divergent X-ray beams into low-divergence quasi-parallel beams. These lens devices are primarily used in X-ray diffraction (XRD) and wavelength dispersive spectroscopy (WDS).

Polycapillary focusing lens devices collect X-rays from the source over a large solid angle and focus them into a spot as small as 10 µm. The resulting X-ray flux density is several orders of magnitude higher than that obtained with conventional pinhole collimators. The primary application of these lens devices is micro X-ray fluorescence (XRF) analysis, widely used in thin film and plating analysis, precious metal evaluation, alloy measurement, and circuit board coating monitoring. These lens devices can also be used for detection in applications such as confocal XRF analysis and superconducting energy-dispersive X-ray spectrometers. The use of polycapillary focusing lens devices significantly improves detection sensitivity and allows high performance with low-power X-ray tubes. Micrometer-level spatial resolution enables application in the evaluation of small features in electronics and precious metals. Polycapillary lens devices provide gains of 100x-10,000x, with output focal spots as small as 10 µm.

Features

Order-of-magnitude flux gain from micrometer-sized spots

• Integrated with compact low-power supplies, providing flux equivalent to rotating anode sources    
 
• Broad spectral bandwidth: 50 eV - 50 KeV

• Point-to-point focusing beams

• Point-to-parallel beams

• Customizable housing designs


Features & Advantages

1Extremely high flux density
2Improved spatial resolution
3Well-suited for analyzing irregularly shaped, unprepared, or low-impedance samples

Specifications


Focusing Optics

Working distance (mm)2492050100200
Applications include micro-XRF for elemental
mapping, plating thickness and fine feature analysis.
Focal spot size* (µm, FWHM, 17.4keV)7152545100180300
Intensity gain* (vs а plnhole collimator of same size, 100mm fгom the source)6000450035002000800300120

Note: *With а 100μm X-ray source.


Half-focusing Optics (XRF/XAS)Applications include micro XRF, micro XAS, and confocal XRF.
Working distance (mm)2492050
Focal spot size* (µm, FWHM, 17.4keV)7152545100
Intensity gain*(vs a pinhole collimator of same size)85055040020080

Note: *With an incident beam of 2mm in diameter and a divergent angle of <0.5mrad


Collimating/Parallel Beam Optics (XRD/WDS/XRF)Applications include powder XRD, texture and stress analysis, WDS and confocal XRF.
Output beam diameter (mm)0.5123461015
Intensity gain*1245130250370470680850

Note: *With а 50μm X-ray source at 8keV, The lFD of the optics is 18mm and the output divergent angle is 0.2 degree.



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