TEUS-LPP Compact laser-drivenThe plasma extreme ultraviolet (EUV) light source is based on a rapidly rotating liquid metal target. This novel LPP target, combined with traditional debris mitigation technology, is the optimal solution for a clean EUV light source. With its high brightness, cleanliness, and low energy jitter, it is well suited for applications requiring high-brightness EUV light sources in high-volume manufacturing, such as mask inspection based on EUV microscopy, or for small-scale lithography production and experimental applications. The performance and stability of this light source have been validated through the delivery of multiple TEUS units.