Exclusive Authorization! proLINE Compact Soft X-ray Light Source
Features: laser-driven plasma EUV light source, high photon flux, monochromatic or broadband continuous EUV output, multiple customizable wavelengths available, no electrode contamination, low debris generation, small source size, high brightness. Turnkey radiation source in the 1-20nm (60-1000eV) spectral range. Long-term stable plasma source with low maintenance cost and intuitive operation via software control. Optional focusing device and monochromator available.
Model: proLINE
Brand: HP Spectroscopy
Introduction
Compact laser-driven plasma EUV light source
Turnkey radiation source in the 1-20 nm (60-1000 eV) spectral range.
Long-term stable plasma source with low maintenance costs and intuitive operation via software control.
* Optional focusing unit and monochromator available.
Features & Advantages
Specifications
类型 | 无碎屑激光驱动等离子体XUV源 | ||
气体靶材 | 氪气、氮气、氙气等多种气体靶材可选 | ||
重复率 | 20Hz | ||
源功率稳定性 | ±1.5% | ||
波长范围 | 1.5nm-6nm, 2.16nm, 2.48nm, 2.88nm, 13.0nm, 13.5nm等多种波长可选 | ||
发散角度 | 2pi | ||
真空兼容度 | <10-6mbar（更高真空度可定制） | ||
激光安全等级 | 1 | ||
占地面积 | 1m x 1m | ||
氪气 | 氮气 | 氙气 | |
能量范围 | 1.5-6nm | 2.48nm, 2.88nm | 13.0nm, 13.5nm |
光通量 | 2·1015ph/s/sr | 1·1014ph/s/sr | 7·1014ph/s/s |
输出功率（2pi发散角） | 200mW | 10mW | 70mW |
Typical Applications
- EUV metrology
- Mask defect inspection
- Resist development
- Extreme ultraviolet microscopy
- Water window microscopy
- NEXAFS spectroscopy
