13.5nm EUV Transmission and Reflection Test Patterns
For performance testing of micro-exposure tools or capability validation of defect detection techniques (PTY microscopy, Schwarzschild objective-based microscopy, etc.), leveraging our years of experience and strong high-precision micro/nano structure fabrication and coating capabilities, we can provide various types of extreme ultraviolet (EUV) test patterns.
Introduction
For performance testing of micro-exposure tools or capability verification of defect detection techniques (such as CDI, PTY, and EUV full-field microscopy), based on years of experience and strong capabilities in high-precision micro/nano structure fabrication and coating, our company can provide various types of extreme ultraviolet (EUV) test patterns.
Specifications
1) Based on nano-transmission grating-type transmission test structures
2) Fabricating HSQ or metal absorber micro/nano patterns on EUV multilayer coatings
3) Depositing EUV multilayer coatings on the HSQ or metal absorber micro/nano patterns
Literature
3 references found
optiXfab fabricated an EUV mirror containing engineered defects for a laboratory-based reflection-mode EUV ptychography imaging system to test the system's imaging performance. The mirror was made by etching pits of a 1951 USAF resolution test chart into a silicon substrate and then coating it with Mo/Si multilayer films.
optiXfab provided coating services for test samples of the reflection-mode EUV mask scanning lensless imaging microscope (RESCAN) at the Swiss Light Source. The sample consisted of a patterned SiO2 absorber fabricated by electron beam lithography on top of a Mo/Si readout multilayer film coated on a patterned silicon wafer.
optiXfab coated Mo/Si multilayer films on substrates with encoded defects fabricated using electron beam lithography. This mirror with known defects will be used for imaging capability testing of an optical dark-field EUV microscopy system (a system based on a DDP light source and a Schwarzschild objective).
About Top Unistar and optiX fab
optiX fab, Germany, is a spin-off company incubated by Fraunhofer IOF and founded in 2013 to commercialize Fraunhofer IOF's research and development activities in XUV/soft and hard X-ray optics, dedicated to the design, development, and manufacture of various multilayer mirrors.optiXfab hasprovided customized multilayer and grazing-incidence optics for the XUV/soft and hard X-ray spectral ranges to high-end manufacturers, research institutes, universities, and synchrotron customers worldwide. Top Unistar, in partnership with optiXfab, offers Chinese users all pre-sales consultation, sales, and after-sales services. Additionally, as a leading service and solution provider in the EUV-X-ray field, Top Unistar has built up a certain inventory ofEUV and X-ray related equipment and core components, enabling rapid delivery to better serve our users. We have also established a well-equippedX-ray open laboratory, equipped with multiple advanced X-ray light source systems, optical components, and detectors, capable of supporting diverse testing, preliminary research, and validation work including X-ray imaging, phase-contrast imaging, diffraction analysis, fluorescence detection, and characterization of X-ray source performance.
We are a team passionate about extreme ultraviolet (EUV) and X-ray technologies. If you have any questions and would like to communicate or discuss with us, do not hesitate to contact us directly.
