13.5nm EUV Light Source Multilayer Collector Mirror
Laser-driven plasma EUV light sources typically emit in 4π steradians. To collect as many 13.5nm in-band photons as possible, a sufficiently large collection solid angle is usually required. We can supply Mo/Si multilayer collectors with an aperture of approximately 700mm. The mirrors can withstand extremely high temperatures, and we offer refurbishment services for contaminated collector mirrors.
Model: 定制
Brand: optiX fab.
Introduction
Beijing Top Unistar Technology Co., Ltd. has accumulated nearly a decade of in-depth expertise in the X-ray and extreme ultraviolet (EUV) fields, along with a solid understanding of EUV optical technology trends and market demands in China. Similarly founded in 2013, Germany-based optiXfab specializes in commercializing the Fraunhofer Institute's patented Mo/Si multilayer technology and has produced nearly 20,000 high-performance EUV and X-ray mirrors for customers, most of whom are in the semiconductor and aerospace industries, including key optical components such as collector mirrors for LLP light sources and Schwarzschild objectives. With extensive industrialization experience and mature manufacturing processes, and based on long-term, in-depth technical exchanges and market assessments, we have established a deep cooperation and decided to further extend this semiconductor-industry-verified advanced coating technology to scientific research applications. Together, we have launched high-performance Mo/Si multilayer mirrors for the 13.5 nm wavelength band, available in standard sizes such as 1 inch and 1/2 inch. This product series can be widely applied in cutting-edge research areas including HHG light sources, laser-driven plasma light sources, EUV imaging, EUV metrology, and EUV spectroscopy. Additionally, related products are now stocked locally in China, enabling rapid response and delivery to provide more efficient and convenient support for users' research projects.
Laser-driven plasma EUV light sources typically emit with 4π divergence. To collect as many 13.5 nm in-band photons as possible, a sufficiently large collection solid angle is usually required. We offer Mo/Si multilayer collector mirrors with apertures up to approximately 700 mm. Through special coating and substrate cooling designs, the mirrors can operate at extremely high temperatures. For contaminated collector mirrors, we provide refurbishment services.
Features & Advantages
Specifications
Measured reflectance curve
Reflectance comparison before and after refurbishment
Applications
About Top Unistar and optiX fab
optiX fab, Germany, is a spin-off company incubated by Fraunhofer IOF and founded in 2013 to commercialize Fraunhofer IOF's research and development activities in XUV/soft and hard X-ray optics, dedicated to the design, development, and manufacture of various multilayer mirrors.optiXfab hasprovided customized multilayer and grazing-incidence optics for the XUV/soft and hard X-ray spectral ranges to high-end manufacturers, research institutes, universities, and synchrotron customers worldwide. Top Unistar, in partnership with optiXfab, offers Chinese users all pre-sales consultation, sales, and after-sales services. Additionally, as a leading service and solution provider in the EUV-X-ray field, Top Unistar has built up a certain inventory ofEUV and X-ray related equipment and core components, enabling rapid delivery to better serve our users. We have also established a well-equippedX-ray open laboratory, equipped with multiple advanced X-ray light source systems, optical components, and detectors, capable of supporting diverse testing, preliminary research, and validation work including X-ray imaging, phase-contrast imaging, diffraction analysis, fluorescence detection, and characterization of X-ray source performance.
We are a team passionate about extreme ultraviolet (EUV) and X-ray technologies. If you have any questions and would like to communicate or discuss with us, do not hesitate to contact us directly.
