13.5nm Half-Transparent Half-Reflective Beam Splitter

Beijing Top Unistar Technology Co., Ltd. has accumulated nearly a decade of in-depth expertise in the X-ray and extreme ultraviolet (EUV) fields, along with a solid understanding of EUV optical technology trends and the demands of the Chinese market. Founded in the same year as Top Unistar, 2013, Germany's optiXfab specializes in commercializing the Fraunhofer Institute's patented Mo/Si multilayer technology and has produced nearly 20,000 high-performance EUV and X-ray mirrors for customers, most of whom are in the semiconductor and aerospace industries, including key optical components such as collector mirrors for LLP light sources and Schwarzschild objectives. With extensive industrialization experience and mature manufacturing processes, and based on long-term, in-depth technical exchanges and market analysis between the two parties, we have established a deep cooperation and decided to further extend this semiconductor-industry-verified advanced coating technology to scientific research applications. Together, we have launched high-performance Mo/Si multilayer mirrors for the 13.5 nm wavelength band, available in standard sizes including 1 inch and 1/2 inch. This product series can be widely applied in cutting-edge research areas such as HHG light sources, laser-driven plasma light sources, EUV imaging, EUV metrology, and EUV spectroscopy. In addition, related products are now stocked locally in China, enabling rapid response and delivery to provide more efficient and convenient support for users' research projects.

For applications requiring beam splitting of extreme ultraviolet light, we offer Mo/Si-coated beam splitters with mature processes, stable performance, and controllable reflectance and transmittance. Through flexible design of the multilayer and substrate film, we can precisely control transmittance and reflectance, and the film dimensions can also be customized flexibly.