13.5 nm Extreme Ultraviolet Schwarzschild Objective
Schwarzschild objectives are increasingly used as imaging optics in the EUV spectral region due to their large aperture, high mechanical stability, and absence of chromatic aberration. An EUV Schwarzschild objective consists of a primary and a secondary mirror coated with Mo/Si multilayer films, on which spherical and aspherical surfaces can be employed. The optical components are stress-free and mechanically stably mounted using solid-state hinges. Corrective adjustments of the mirrors can be performed during operation.
Introduction
Beijing Top Unistar Technology Co., Ltd. has accumulated nearly a decade of in-depth expertise in the fields of X-ray and extreme ultraviolet (EUV) technology, along with a solid understanding of EUV optical technology development trends and market demands in China. Similarly founded in 2013, Germany-based optiXfab specializes in commercializing the Fraunhofer Institute's patented Mo/Si multilayer coating technology. To date, it has produced nearly 20,000 high-performance EUV and X-ray mirrors for customers, most of whom are in the semiconductor and aerospace industries, including key optical components such as collector mirrors for LLP light sources and Schwarzschild objectives. With extensive industrialization experience and mature manufacturing processes, and based on long-term, in-depth technical exchanges and market assessments between the two parties, we have established a deep cooperation and decided to further extend this advanced coating technology, proven in the semiconductor industry, to scientific research applications. Together, we have launched high-performance Mo/Si multilayer mirrors for the 13.5 nm wavelength band, available in standard sizes such as 1 inch and 1/2 inch. This product series can be widely applied to cutting-edge research fields including HHG light sources, laser-driven plasma light sources, EUV imaging, EUV metrology, and EUV spectroscopy. In addition, related products are now stocked locally in China to enable rapid response and delivery, providing more efficient and convenient support for users' scientific research projects.
Schwarzschild objectives are increasingly used as imaging optics in the EUV spectral region due to their large aperture, high mechanical stability, and achromatic characteristics. An EUV Schwarzschild objective consists of a primary and a secondary mirror coated with Mo/Si multilayers, on which both spherical and aspherical surfaces can be employed. The optical components are stress-free and mounted mechanically stably using solid-state hinges. Corrective adjustments of the mirrors can be performed during operation.
Specifications
Main parameters
| 20x | 10x | |
| Magnification | 21.34 | 9.8 |
| NA | 0.2 | 0.44 |
| Focal distance | 26.95 | 53.06 |
| Wavelength | 13.5nm | 13.5nm |
| Primary mirror 1 | ||
| Curvature | 100mm | 140mm |
| Diameter | 52mm | 106mm |
| Secondary mirror - 2 | ||
| Curvature | -35mm | -175mm |
| Diameter | 11mm | 48mm |
Literature
1 references found
We have developed an extreme ultraviolet (EUV) microscope employing a Schwarzschild objective, optimized for single-shot sub-micrometer imaging of laser plasma targets. The microscope was designed and constructed to image the scattering signals produced by solid-density hydrogen jets heated by EUV radiation. Using single pulses at a wavelength of 13.5 nm from the free-electron laser facility FLASH in Hamburg, we successfully imaged cryogenic hydrogen targets. In a single exposure, we observed hydrogen jets containing ice fragments and obtained images with sub-micrometer spatial resolution. This in-situ EUV imaging technique is expected to provide new experimental capabilities for studying warm dense matter in micrometer-scale samples during laser plasma experiments.
About Top Unistar and optiX fab
optiX fab GmbH, Germany, is a spin-off company incubated by Fraunhofer IOF and founded in 2013 to commercialize Fraunhofer IOF's research and development activities in XUV/soft and hard X-ray optics, dedicated to the design, development, and fabrication of various multilayer mirrors.optiXfab hasprovided customized multilayer and grazing-incidence optics for the XUV/soft and hard X-ray spectral ranges to leading global manufacturers as well as research institutes, universities, and synchrotron customers. Top Unistar, in partnership with optiXfab, offers all pre-sales consultation, sales, and after-sales services to users in China. Additionally, as a frontier service and solution provider in the EUV-X-ray field, Top Unistar has built up a certain inventory ofEUV and X-ray related equipment and core components, enabling rapid delivery capability to better serve our users. We have also established a well-equippedX-ray open laboratory, equipped with multiple advanced X-ray light source systems, optical components, and detectors, capable of supporting diverse testing, preliminary research, and validation work including X-ray imaging, phase-contrast imaging, diffraction analysis, fluorescence detection, and characterization of X-ray source performance.
We are a team passionate about extreme ultraviolet (EUV) and X-ray technologies. If you have any questions and would like to communicate or discuss with us, do not hesitate to contact us directly.
